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Residual Stress Characterisation of Thin Sputtered Copper Films on Silicon Exploiting Membrane Resonance within a Specimen Centred Approach

机译:硅剥削膜共振薄溅射铜膜的残余应力表征在标本居中方法中

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Thin metal layers, especially those made of copper, are omnipresent in today’s packaging applications as e.g. RDL structures, conductor traces on flexible and stretchable substrates, chip finishes or terminal metallisation, serving electrical, thermal or
机译:薄金属层,尤其是由铜制成的金属层是今天的包装应用中的全部普遍存在,如例如: RDL结构,柔性且可伸缩基板上的导体迹线,芯片饰面或终端金属化,供应电气,热量或

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