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Physical, small-signal and pulsed thermal impedance characterization of multi-finger SiGe HBTs close to the SOA edges

机译:靠近SOA边缘的多指SiGe HBT的物理,小信号和脉冲热阻抗表征

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摘要

A thermal impedance model of single-finger and multi-finger SiGe heterojunction bipolar transistors (HBTs) is presented. The heat flow analysis through the device has to be considered in two diffusion parts: the front-end-of-line (FEOL) diffusion and the back-end-of-line (BEOL) diffusion. Therefore, this new thermal impedance model features multi-poles network which has been incorporated in HiCuM L2 compact model. The HiCuM compact model simulation results are compared with on-wafer low-frequency S-parameters measurements at room temperature highlighting the device frequency dependence of self-heating mechanism. The simulation results are also compared to pulse measurements to improve reliability analysis.
机译:提出了单指和多指SiGe异质结双极晶体管(HBT)的热阻模型。通过设备的热流分析必须考虑两个扩散部分:前端(FEOL)扩散和后端(BEOL)扩散。因此,这种新的热阻抗模型具有多极网络功能,该网络已被整合到HiCuM L2紧凑模型中。将HiCuM紧凑模型仿真结果与室温下的晶片上低频S参数测量结果进行了比较,突显了自加热机制的器件频率依赖性。还将仿真结果与脉冲测量结果进行比较,以改善可靠性分析。

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