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Wafer-Scale Hierarchically Textured Silicon for Surface Cooling

机译:晶圆级分层纹理硅,用于表面冷却

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Conventional surface materials for cooling systems, often based on metals, generally offer excellent mechanical and thermal conduction properties. However, metals are known to be very reflective, and their emissivity is very low, which limits effective radiative heat transfer from the surface to the environment - a factor that is particularly important when there is a high difference in temperature between the surface and ambient. Here we will demonstrate a novel material coating based on silicon that will offer transformative surface cooling and omniphobic properties by controlling the microscale surface texture on silicon wafers. Surface texturing silicon or micro-structuring silicon using maskless chemical assisted etching or reactive-ion etching has received much attention recently for its applications in photonics and solar cells 1-3. Colloquially referred to as “black silicon”, textured silicon surfaces comprised of micro-structured pillars or roughness have been known to absorb (or emit) light very effectively in the visible spectrum, which makes the surface turn black4-6. Past studies have focused on the modified optical properties in the visible to near-infrared spectrum (400nm to 1.3um), relevant mostly to photonic applications, but we show that the optical properties maintain a high emissivity across the near-mid IR spectrum of 9-13 uM. The high emissivity across the mid-IR creates a unique opportunity to produce an inexpensive, highly adaptable, and scalable layer which demonstrates enhanced passive surface cooling relative to conventional materials. We will demonstrate a novel maskless process that utilizes a NaOH wet etch which generates micro-pyramidal structures on the order of 5-20 um in height that accomplishes these objectives. Furthermore, by texturing the surface geometry, textured silicon can also be manufactured to offer either hydrophobic or hydrophilic properties, opening the possibility for a material that can have optimized conductive, radiative, and convective properties.
机译:通常基于金属的用于冷却系统的常规表面材料通常具有出色的机械和导热性能。但是,众所周知,金属具有很强的反射性,并且其发射率非常低,这限制了从表面到环境的有效辐射热传递-当表面与环境之间的温度差很大时,这一因素尤其重要。在这里,我们将展示一种基于硅的新型材料涂层,该涂层将通过控制硅晶片上的微尺度表面纹理来提供具有转化性的表面冷却和憎水性。使用无掩模化学辅助蚀刻或反应离子蚀刻的表面纹理化硅或微结构化硅最近在光子学和太阳能电池中的应用受到了广泛关注 1-3 。俗称“黑硅”,由微结构化的支柱或粗糙度组成的纹理化硅表面可以非常有效地吸收(或发射)可见光谱中的光,这会使表面变黑。 4-6 。过去的研究集中在可见光到近红外光谱(400nm至1.3um)中修改的光学特性,这些特性主要与光子应用有关,但是我们表明,在9的近中红外光谱中,光学特性保持了高发射率。 -13 uM。跨中红外的高发射率为生产廉价,高度适应和可扩展的层提供了独特的机会,与传统材料相比,该层展示了增强的无源表面冷却。我们将展示一种新颖的无掩模工艺,该工艺利用NaOH湿法蚀刻产生5至20 um量级的微型金字塔结构,从而实现了这些目标。此外,通过纹理化表面几何形状,也可以制造纹理化的硅以提供疏水性或亲水性,从而为具有最佳导电,辐射和对流特性的材料开辟了可能性。

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