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Impact of Effective Mass on Transport Properties and Direct Source-to-Drain Tunneling in Ultrascaled Double Gate Devices: a 2D Multi-Subband Ensemble Monte Carlo study

机译:有效质量对超大规模双栅器件中的输运特性和直接源极至漏极隧穿的影响:二维多子带组合蒙特卡洛研究

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In the simulation-based research of aggressively scaled CMOS transistors, it is mandatory to combine advanced transport simulators and quantum confinement effects with first-principle techniques, which are the state-of-the-art to calculate the electronic band structure of nanomaterials. In this work, we have calculated the effective masses in DGSOI transistors and FinFETs using density functional theory (DFT) and investigate their impact on direct Source-to-Drain tunneling (S/D tunneling) using a 2D Multi-Sub-band Ensemble Monte Carlo (MS-EMC) simulator. The results for a particular VDS= 0.5 V show that, in the subthreshold regime, the effective mass variation increases the tunneling probability for the DGSOI transistor leading to a current degradation, whereas this difference is reduced and even reversed for the FinFET.
机译:在基于仿真的超大规模CMOS晶体管研究中,必须将先进的传输模拟器和量子约束效应与第一原理技术相结合,这是计算纳米材料电子能带结构的最新技术。在这项工作中,我们使用密度泛函理论(DFT)计算了DGSOI晶体管和FinFET中的有效质量,并使用2D多子带集成Monte方法研究了它们对直接源极到漏极隧穿(S / D隧穿)的影响。 Carlo(MS-EMC)模拟器。特定V的结果 DS = 0.5 V表示,在亚阈值范围内,有效质量变化会增加DGSOI晶体管的隧穿概率,从而导致电流下降,而FinFET的这种差异减小甚至相反。

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