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Characterization of Phase Change Material Germanium Telluride for RF Switches

机译:用于射频开关的相变材料碲化锗的表征

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This paper presents the simulation and measured results of a phase-change material (PCM) based radio-frequency (RF) switch optimized to improve the ratio between OFF-state and ON-state resistivity. Various samples having germanium telluride (GeTe) films are developed and imaged using Atomic Force Microscope (AFM) and are compared with cross-wafer resistance measurement results to determine the optimum sputtering conditions of the GeTe films. A simple four-layer fabrication process for GeTe based switches is presented. Several switches with different micro-heater dimensions are compared to investigate the performance of heater and its impact on the isolation performance of switch. A compact RF series switch has been measured, demonstrating an insertion loss of only 0.29 dB and an OFF-state isolation better than 23dB over DC-26 GHz frequency range, yielding a relatively high Roff/Ron ratio.
机译:本文介绍了一种基于相变材料(PCM)的射频(RF)开关的仿真和测量结果,该开关经过优化以提高截止状态和导通状态之间的电阻率之比。使用原子力显微镜(AFM)对具有碲化锗(GeTe)膜的各种样品进行显影和成像,并将其与耐晶圆划片性的测量结果进行比较,以确定GeTe膜的最佳溅射条件。提出了一种用于基于GeTe的开关的简单四层制造工艺。比较了几种具有不同微型加热器尺寸的开关,以研究加热器的性能及其对开关隔离性能的影响。测量了紧凑的RF系列开关,在DC-26 GHz频率范围内,插入损耗仅为0.29 dB,OFF状态隔离度优于23dB,从而产生了相对较高的Roff / Ron比。

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