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Computational Study on Schottky Barrier Height Extraction for Ballistic Nanotube Transistors

机译:弹道纳米管晶体管肖特基势垒高度提取的计算研究

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The engineering of contacts to semiconducting nanotubes still relies on minimizing the potential barrier for charge injection by carefully choosing the metal work function. Thus, precise barrier height extraction from current voltage curves of nanotube transistors is an essential characterization technique. Identifying the flat band voltage VFB is a known recipe to determine the Schottky barrier height. In the present brief, we report on the challenges to correctly identify VFB, when charge carriers cross a short transistor channel without loss of energy and are injected largely via tunneling.
机译:与半导体纳米管的接触工程仍然依赖于通过仔细选择金属功函数来最小化电荷注入的势垒。因此,从纳米管晶体管的电流电压曲线中精确提取势垒高度是一项必不可少的表征技术。识别平带电压V FB 是确定肖特基势垒高度的已知方法。在本摘要中,我们报告了正确识别V所面临的挑战 FB ,当电荷载流子跨过一个短的晶体管通道而没有能量损失时,大部分通过隧道注入。

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