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Computational Study on Schottky Barrier Height Extraction for Ballistic Nanotube Transistors

机译:弹道纳米管晶体管肖特基势垒高度提取的计算研究

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The engineering of contacts to semiconducting nanotubes still relies on minimizing the potential barrier for charge injection by carefully choosing the metal work function. Thus, precise barrier height extraction from current voltage curves of nanotube transistors is an essential characterization technique. Identifying the flat band voltage VFB is a known recipe to determine the Schottky barrier height. In the present brief, we report on the challenges to correctly identify VFB, when charge carriers cross a short transistor channel without loss of energy and are injected largely via tunneling.
机译:通过仔细选择金属功函数,对半导体纳米管的触点工程仍然依赖于最小化电荷喷射的潜在屏障。因此,从纳米管晶体管的电流电压曲线提取的精确阻挡高度提取是必需的表征技术。识别平带电压V fb 是一个已知的配方,用于确定肖特基势垒高度。在本简介中,我们报告了正确识别v的挑战 fb ,当电荷载波通过短晶体管通道而不会损失能量并且在很大程度上通过隧道喷射。

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