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A Study of the Two-Way Effects of Cover Source Mismatch and Texture Complexity in Steganalysis

机译:隐写分析中掩盖源不匹配和纹理复杂度的双向效应研究

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Cover source mismatch (CSM) occurs when a detection classifier for steganalysis trained on objects from one cover source is tested on another source. However, it is very hard to find the same sources as suspicious images in real-world applications. Therefore, the CSM is one of the biggest stumbling blocks to hinder current classifier based steganalysis methods from becoming practical. On the other hand, the texture complexity (of digital images) also plays an important role in affecting the detection accuracy of steganalysis. Previous work seldom conduct research on the interaction between the two factors of the CSM and the texture complexity. This paper studies the interaction between the two factors, aiming to improve the steganalysis accuracy. We propose a effective method to measure the texture complexity via image filtering, and use the two-way analysis of variance to study the interaction between the two factors. The experimental results have shown that the interaction between the two factors affects the detection accuracy significantly. We also design a method to improve the detection accuracy of steganalysis by utilizing the interaction of the two factors.
机译:当对来自一个掩盖源的对象训练的隐身分析检测分类器在另一源上进行测试时,会发生掩盖源不匹配(CSM)。但是,在实际应用中很难找到与可疑图像相同的来源。因此,CSM是阻碍当前基于分类器的隐写分析方法变为现实的最大绊脚石之一。另一方面,(数字图像的)纹理复杂度在影响隐写分析的检测精度方面也起着重要作用。先前的工作很少研究CSM的两个因素与纹理复杂度之间的相互作用。本文研究了这两个因素之间的相互作用,旨在提高隐写分析的准确性。我们提出了一种通过图像滤波来测量纹理复杂度的有效方法,并使用方差的双向分析来研究两个因素之间的相互作用。实验结果表明,这两个因素之间的相互作用会显着影响检测精度。我们还设计了一种方法,通过利用两个因素的相互作用来提高隐写分析的检测精度。

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