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A Study of the Two-Way Effects of Cover Source Mismatch and Texture Complexity in Steganalysis

机译:覆盖源失配和纹理复杂性在塞巴析中的双向效应研究

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Cover source mismatch (CSM) occurs when a detection classifier for steganalysis trained on objects from one cover source is tested on another source. However, it is very hard to find the same sources as suspicious images in real-world applications. Therefore, the CSM is one of the biggest stumbling blocks to hinder current classifier based steganalysis methods from becoming practical. On the other hand, the texture complexity (of digital images) also plays an important role in affecting the detection accuracy of steganalysis. Previous work seldom conduct research on the interaction between the two factors of the CSM and the texture complexity. This paper studies the interaction between the two factors, aiming to improve the steganalysis accuracy. We propose a effective method to measure the texture complexity via image filtering, and use the two-way analysis of variance to study the interaction between the two factors. The experimental results have shown that the interaction between the two factors affects the detection accuracy significantly. We also design a method to improve the detection accuracy of steganalysis by utilizing the interaction of the two factors.
机译:当在另一个源上检测到从一个覆盖源的物体训练的检测分类器时,发生覆盖源不匹配(CSM)。但是,很难找到与现实世界应用中可疑图像相同的来源。因此,CSM是最大的绊倒块之一,用于阻碍基于基于分类器的STEG分析方法的实际障碍。另一方面,纹理复杂性(数码图像)也在影响隐草的检测准确性方面发挥着重要作用。以前的工作很少对CSM的两个因素与纹理复杂性之间的相互作用进行研究。本文研究了两个因素之间的相互作用,旨在提高隐草精度。我们提出了一种通过图像滤波来测量纹理复杂性的有效方法,并使用双向分析来研究两个因素之间的相互作用。实验结果表明,两个因素之间的相互作用显着影响了检测精度。我们还通过利用两个因素的相互作用来设计一种提高隐点的检测准确性的方法。

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