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首页> 外文期刊>Multimedia Tools and Applications >Study on the interaction between the cover source mismatch and texture complexity in steganalysis
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Study on the interaction between the cover source mismatch and texture complexity in steganalysis

机译:隐写分析中掩盖源不匹配与纹理复杂度之间相互作用的研究

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摘要

Cover source mismatch (CSM) occurs when a detection classifier for steganalysis trained on objects from one cover source is tested on another source. However, it is very hard to find the same sources as suspicious images in real-world applications. Therefore, the CSM is one of the biggest stumbling blocks to hinder current classifier based steganalysis methods from becoming practical. Meanwhile, the texture complexity (of digital images) also plays an important role in affecting the detection accuracy of steganalysis. Previous work seldom conduct research on the interaction between the two factors of the CSM and the texture complexity (TC). This paper studies the interaction between the two factors and explore certain factor related to cover source mismatch, aiming to improve the steganalysis accuracy in the case of CSM. We propose an effective method to measure the TC via image filtering, and use the two-way analysis of variance to study the interaction between the two factors. Both non-adaptive and adaptive steganography experiments are carried out with different levels of TC and CSM. The experimental results have shown that the interaction between the two factors affects the detection accuracy significantly.
机译:当对来自一个掩盖源的对象进行训练的隐身分析检测分类器在另一源上进行测试时,会发生掩盖源不匹配(CSM)。但是,在实际应用中很难找到与可疑图像相同的来源。因此,CSM是阻碍当前基于分类器的隐写分析方法变为现实的最大绊脚石之一。同时,(数字图像的)纹理复杂度在影响隐写分析的检测精度方面也起着重要作用。先前的工作很少研究CSM的两个因素与纹理复杂度(TC)之间的相互作用。本文研究了这两个因素之间的相互作用,并探讨了与掩盖源不匹配有关的某些因素,旨在提高CSM情况下的隐写分析准确性。我们提出了一种通过图像滤波来测量TC的有效方法,并使用方差的双向分析来研究两个因素之间的相互作用。使用不同级别的TC和CSM进行非自适应和自适应隐写实验。实验结果表明,两个因素之间的相互作用会显着影响检测精度。

著录项

  • 来源
    《Multimedia Tools and Applications》 |2019年第6期|7643-7666|共24页
  • 作者单位

    Hefei Univ Technol, Sch Comp Sci & Informat Engn, Hefei 230601, Anhui, Peoples R China|Anhui Prov Key Lab Ind Safety & Emergency Technol, Hefei 230601, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Comp Sci & Informat Engn, Hefei 230601, Anhui, Peoples R China|Anhui Prov Key Lab Ind Safety & Emergency Technol, Hefei 230601, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Comp Sci & Informat Engn, Hefei 230601, Anhui, Peoples R China|Anhui Prov Key Lab Ind Safety & Emergency Technol, Hefei 230601, Anhui, Peoples R China;

    Hefei Univ Technol, Sch Comp Sci & Informat Engn, Hefei 230601, Anhui, Peoples R China|Anhui Prov Key Lab Ind Safety & Emergency Technol, Hefei 230601, Anhui, Peoples R China;

    Wuhan Univ, Sch Cyber Sci & Engn, Wuhan 430072, Hubei, Peoples R China;

    Wuhan Univ, Sch Cyber Sci & Engn, Wuhan 430072, Hubei, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Cover source mismatch; Texture complexity; Analysis of variance; Steganalysis;

    机译:覆盖源不匹配;纹理复杂度;方差分析;隐写分析;

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