Electron-beam lithography is the first choice for the fabrication of photomasks, especially for mask aligner applications. Therefore, diffractive structures in photomasks got essential as a resolution enhancement technique. The extension of the VSB writing principle with the character projection exposure regime offers a highly flexible fabrication technique for high-resolution nano-pattern for a variety of optical applications, not only for photomasks but also for direct patterning of photonic crystals or meta-materials.
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