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Precision measurements of quantum hall resistance plateau in doping-controlled graphene device

机译:掺杂控制石墨烯器件中量子霍尔电阻平台的精密测量

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We report preliminary results of precision measurements of the graphene quantum Hall resistance plateau value with respect to magnetic field, temperature and applied current. Resistance value of SiC graphene Hall device was modulated by chemical doping, heating, and UV irradiation at the ambient condition. Precision measurements for Rh (filing factor v = 2) were then performed with a cryogenic current comparator resistance bridge. Relative deviation from RH (v = 2) less than 30 parts in 109 can be achieved down to 7 T of magnetic field and up to 6 K of temperature with driving current of 19. 37 μA.
机译:我们报告了有关磁场,温度和施加电流的石墨烯量子霍尔电阻平稳值的精密测量的初步结果。 SiC石墨烯霍尔器件的电阻值是通过在环境条件下进行化学掺杂,加热和紫外线照射来调节的。然后使用低温电流比较器电阻桥对Rh进行精密测量(填充系数v = 2)。相对于RH(v = 2)的相对偏差小于109的30份,在驱动电流为19μA的情况下,可在低至7 T的磁场和高至6 K的温度下实现。

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