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Precision Measurements of Quantum Hall Resistance Plateau in Doping-Controlled Graphene Device

机译:掺杂控制石墨烯装置中量子霍尔电阻平台的精确测量

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We report preliminary results of precision measurements of the graphene quantum Hall resistance plateau value with respect to magnetic field, temperature and applied current. Resistance value of SiC graphene Hall device was modulated by chemical doping, heating, and UV irradiation at the ambient condition. Precision measurements for R_H (filing factor v = 2) were then performed with a cryogenic current comparator resistance bridge. Relative deviation from R_H (v = 2) less than 30 parts in 10~9 can be achieved down to 7 T of magnetic field and up to 6 K of temperature with driving current of 19. 37 μA.
机译:我们向磁场,温度和施加电流报告石墨烯量子霍尔阻力平台值的精确测量的初步结果。通过化学掺杂,加热和环境条件下的紫外线照射调节SiC石墨烯厅装置的电阻值。然后用低温电流比较电阻桥进行R_H(归档因子V = 2)的精确测量。在10〜9中的r_h(v = 2)的相对偏差可以降低到7℃的磁场,高达6k的温度,驱动电流为19.37μA。

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