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Optimization of Microwave Injection at Compact ECR Ion Source

机译:紧凑型ECR离子源微波注射的优化

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A prototype compact ECR ion source, named Kei3, has been developed for the production of various ions. Kei3 consists of upstream vacuum chamber, permanent magnets and plasma chamber, and downstream vacuum chamber with extraction system. The magnetic field was copied from present prototype Kei2. As a result of basic beam tests of Kei3, the maximum beam currents of C4+, N5+, O6+ and Ne7+ were 565 μA, 185 μA, 99 μA, and 50.5 μA, respectively. In order to increase the beam current of heavy ions such as argon, we modified the microwave injection. Moreover, we tested two-frequency heating for increasing the current of highly charged argon. A maximum current of 60.4 μA for Ar7+ was obtained in plate position of 7 mm at longer waveguide. Second, we tested two-frequency heating technique for increase the highly charged argon ions. We could increase a beam intensity of Ar8+ from 9.7 to 15.4 μA.
机译:已经开发了一个名为KEI3的原型紧凑型ECR离子源,用于生产各种离子。 Kei3由上游真空室,永磁体和等离子体室,以及带有提取系统的下游真空室。从本发明原型Kei2复制磁场。由于KEI3的基本光束测试,C的最大光束电流 4 + ,n 5 + ,O. 6 + 和ne 7 + 分别为565μA,185μA,99μA和50.5μA。为了增加氩气等重离子的光束电流,我们修改了微波注射。此外,我们测试了两个频率的加热,以增加高度充电的氩气的电流。用于AR的最大电流为60.4μA 7 + 在更长的波导下在7mm的板位置获得。其次,我们测试了两个频率的加热技术,用于增加高度充电的氩离子。我们可以增加AR的光束强度 8 + 从9.7到15.4μA。

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