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Silver sinter paste optimized for pressure sintering under air atmos-phere on precious and non-precious metal surfaces with high reliable sintered joints

机译:银色烧结膏针对贵重和非贵金属表面上的空气烧结下的压力烧结,具有高可靠的烧结关节

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In recent years, silver sinter materials have drawn increasing attention as an interconnect material in power electronics for its unique properties such as high thermal and electrical properties and also as lead replacement solution. Our previous studies have demonstrated the feasibility of semiconductor devices attachment on silver and gold surfaces by either non-pressure or pressure sintering. In this paper, we extended our study to die attachment on bare Cu surfaces by pressure sintering process. We attached Ag metallized Si dies to bare Cu, Ag, and Au metallized substrates by pressure sintering at 230°C with a pressure of 10 MPa for 3 min. An average initial die shear strength of > 10 N/mm~2 was obtained for all sintered samples. The die shear strength increased to > 40 N/mm~2 for all samples after temperature cycling test (-40°C/+150°C) and high temperature storage at 250°C. Our hypothesis is that Ag, Au and Cu continued to diffuse during temperature cycling test and high temperature storage resulting in higher bonding strength. Bending test results further confirm the increase of bonding strength by thermal cycling. After 1000 hours storage at 250°C, cohesive break in the Cu layer was observed for Ag metallized and bare Cu substrates. Our hypothesis is that Cu in the substrate diffuse into silver sintered layer and concurrently Ag diffused into Cu layer of substrate during high temperature storage. Further investigation is required to verify this hypothesis. In contrast, cohesive break in the sinter layer was observed for Au metallized substrate after 1000 hours storage at 250°C indicating that Au metallized layer acts as a barrier to prevent Cu from the substrate from diffusion into silver sintered layer.
机译:近年来,银烧结材料已经引起越来越多的关注,因为在电力电子因为其独特性质的互连材料,例如高的热和电性能,也可以作为铅替代解决方案。我们先前的研究已经通过任一无压或加压烧结表现出对银和金的表面的半导体器件附接的可行性。在本文中,我们扩展我们的研究中,以模片固定在裸露的铜表面通过加压烧结工序。我们附银金属化的Si管芯裸露的Cu,Ag和Au的金属化通过压力基片在230℃下用10MPa的3分钟的压力烧结。 〜2对于所有烧结样品获得的平均初始芯片剪切强度> 10牛顿/毫米。芯片剪切强度提高到> 40牛顿/毫米〜2为温度循环试验(-40℃/ + 150℃)和高温保存在250℃下后的所有样本。我们的假设是银,金,铜温度循环试验,并导致更高的接合强度的高温储存期间继续扩散。弯曲试验结果进一步证实由热循环的结合强度增加。储存1000小时之后在250℃下,观察到Cu层的内聚破为银金属化和裸铜基材。我们的假设是在铜衬底扩散到银烧结层和银同时在高温储存期间扩散到衬底的Cu层。需要进一步研究,以验证这一假设。与此相反,未观察到烧结层内聚破将Au在250℃下1000小时后存储金属化基板,表明金金属化层作为屏障,以防止铜从衬底扩散进入烧结银层。

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