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Functionality Demonstration of a High-Density 2.5V Self-Aligned Split-Gate NVM Cell Embedded into 40nm CMOS Logic Process for Automotive Microcontrollers

机译:用于汽车微控制器的40nm CMOS逻辑工艺中嵌入的高密度2.5V自对准分栅NVM单元的功能演示

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This paper for the first time successfully demonstrates a Logic-compatible, highly reliable, automotive-grade 16Mb flash macro with self- aligned, split-gate FG-based flash cell embedded into a 40nm Low Power CMOS with copper low-K interconnects. Key Features of the flash macro: Dual power supply with operation temperature from -40 to 150ºC; Random Read access 10ns @ worst case condition; Low active and standby power; High raw endurance and data retention lifetime before using ECC. This technology provides large read current window which is compatible with both automotive MCU markets and low power mode tailored for smart card/industrial applications. The 16Mb Design test chip (DTC) with industry-leading cell size has demonstrated functionality with tight cell Vt and read current distributions. The SG NVM cell and erase gate are processed with self-alignment to gate spacer and polysilicon CMP (Chemical Mechanical Polishing) that can be easily integrated in a modular way to the standard logic process.
机译:本文首次成功演示了一个逻辑兼容,高度可靠的汽车级16Mb闪存宏,该宏具有自对准,基于分裂栅FG的闪存单元,嵌入了具有铜低K互连的40nm低功耗CMOS中。 Flash宏的主要特征:双电源,工作温度范围为-40至150ºC;最坏情况下的随机读取访问时间为10ns;低主用和备用电源;使用ECC之前,具有较高的原始耐久性和数据保留寿命。该技术提供了大的读取电流窗口,该窗口与汽车MCU市场和为智能卡/工业应用量身定制的低功耗模式兼容。具有业界领先的单元尺寸的16Mb设计测试芯片(DTC)展示了具有紧凑的单元Vt和读取电流分布的功能。 SG NVM单元和擦除栅极通过与栅极间隔物和多晶硅CMP(化学机械抛光)的自对准进行处理,可以轻松地以模块化方式将其集成到标准逻辑工艺中。

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