首页> 外文会议>IEEE International Conference on Micro Electro Mechanical Systems >Fabrication and characterization of single crystalline 4H-SiC MEMS devices with n-p-n homoepitaxial structure
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Fabrication and characterization of single crystalline 4H-SiC MEMS devices with n-p-n homoepitaxial structure

机译:具有n-p-n同质外延结构的单晶4H-SiC MEMS器件的制备和表征

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This paper reports single crystalline 4H-SiC MEMS with homoepitaxial n-p-n structure and its resonant characteristics under electrostatic actuation. Single crystalline fully exploits the superior material properties of SiC for operations in harsh environments. Compared to previously report p-n structure, the n-p-n structure makes electrostatic actuation applicable which is essentially important for applications of resonators and actuators to sensor devices. Such n-p-n structure, complementing the p-n structure, also further extends the capability of monolithic integration between SiC MEMS and electronic devices and circuits with not only p-n configurations such as diodes, but also n-p-n configurations such as BJTs and MOSFETs, etc.
机译:本文报道了具有同质外延n-p-n结构的单晶4H-SiC MEMS及其在静电作用下的共振特性。单晶硅充分利用了SiC的优异材料性能,可在恶劣的环境下运行。与以前报道的p-n结构相比,n-p-n结构使静电致动适用,这对于将谐振器和致动器应用于传感器设备至关重要。这种n-p-n结构补充了p-n结构,不仅进一步扩展了SiC MEMS与电子器件和电路之间的单片集成能力,不仅具有二极管等p-n配置,而且具有BJT和MOSFET等n-p-n配置。

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