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Formic acid treatment with Pt catalyst for Cu direct and hybrid bonding at low temperature

机译:用Pt催化剂进行甲酸处理以实现低温下铜的直接键合和杂化键合

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A new process of Cu-Cu direct bonding at lower than 200ºC in atmospheric atmosphere was developed. The method is composed of formic acid treatment with Pt catalyst. To demonstrate the feasibility of the method, Cu electrodes samples were designed for characterizing the bonding strength and the contact resistance for the Cu-Cu direct bonding. The bonding strength is about 40MPa, and the contact resistance at the bonding interface is about 0.17mΩ. Both of them are better than those without Pt catalyst. The effects of the Pt catalyst on bonding were investigated and it is concluded that the surface oxide of Cu is reduced effectively by the hydrogen radical generated by formic acid decomposition with Pt catalyst and the Cu formats resulted by the formic acid treatment is decomposed to precipitate very fine Cu grains at the bonded interface.
机译:开发出在大气气氛中低于200℃的Cu-Cu直接键合的新方法。该方法由具有Pt催化剂的甲酸处理组成。为了证明该方法的可行性,设计了Cu电极样品,用于表征Cu-Cu直接键合的粘合强度和接触电阻。粘合强度约为40MPa,键合界面处的接触电阻约为0.17mΩ。它们中的两者都比没有PT催化剂的那些更好。研究了Pt催化剂对键合的影响,并得出结论,Cu的表面氧化物通过与Pt催化剂产生的甲酸分解产生的氢自由基有效减少,由甲酸处理产生的Cu形式分解为非常沉淀粘合界面处的细铜颗粒。

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