CMOS memory circuits; flash memories; hot carriers; integrated circuit reliability; technology CAD (electronics); tunnelling; ATW memory cell; CG-FG coupling factor; asymmetrical tunnel oxide thickness; asymmetrical tunnel window memory cell; commercial TCAD simulator; compatible CMOS fabrication process; control gate-floating gate coupling factor; current consumption; embedded low energy application; hot carrier injection; injection efficiency; non-volatile charge trap memory cell architecture; reliability; size 200 mm; size 90 nm; standard flash floating gate memory cell; Computer architecture; Couplings; Logic gates; Microprocessors; Nonvolatile memory; Programming; Standards; TCAD simulation; asymmetrical oxide thicknesses; endurance; low energy; non-volatile memory;
机译:在Pt / Ti / AI_2O_3 / GO /石墨烯/ SiO_2 / p-Si / Au非易失(FLASH)应用中集成用于宽存储窗口的氧化石墨烯缓冲层/石墨烯浮栅
机译:BipFLASH〜1:适用于高速,低功耗应用的新型非易失性存储单元概念
机译:多层黑色磷和非易失性闪存单元中的隧道电流分析
机译:基于嵌入式低能量应用的Flash架构的新的非易失性存储器单元:ATW(非对称隧道窗口)
机译:非易失性存储器与易失性存储器的集成,用于嵌入式存储器体系结构和信号处理应用
机译:四层石墨烯纳米片与不对称Al2O3 / HfO2隧道氧化物的2.85-nm Si纳米颗粒相比具有增强的非易失性存储特性
机译:用于非易失性存储器应用的异质结构隧道势垒的工程:基于pr的异质结构势垒作为隧道氧化物的潜力