首页> 外国专利> Embedded non-volatile memory with single polysilicon layer memory cells erasable through band to band tunneling induced hot electron and programmable through Fowler-Nordheim tunneling

Embedded non-volatile memory with single polysilicon layer memory cells erasable through band to band tunneling induced hot electron and programmable through Fowler-Nordheim tunneling

机译:具有单多晶硅层存储单元的嵌入式非易失性存储器可通过带间隧道感应热电子擦除,并可通过Fowler-Nordheim隧道编程

摘要

A non-volatile memory includes cells arranged in rows and columns. Each memory cell includes an access portion and a control portion. The access and control portions share an electrically floating layer of conductive material defining a first capacitive coupling with the access portion and a second capacitive coupling with the control portion. The first capacitive coupling defines a first capacity lower than a second capacity defined by the second capacitive coupling. The control portion is configured so that an electric current extracts charge carriers from the electrically floating layer through Fowler-Nordheim tunneling to store a first logic value in the memory cell. The access portion is configured so that an electric current injects charge carriers in the electrically floating layer by injection of band-to-band tunneling-induced hot electrons to store a second logic value, respectively, in the memory cell.
机译:非易失性存储器包括以行和列布置的单元。每个存储单元包括访问部分和控制部分。访问部分和控制部分共享导电材料的电浮动层,该导电材料的电浮动层限定与访问部分的第一电容性耦合和与控制部分的第二电容性耦合。第一电容耦合限定的第一电容低于第二电容耦合限定的第二电容。控制部分被配置为使得电流通过福勒-诺德海姆隧道从电浮置层提取电荷载流子,以将第一逻辑值存储在存储单元中。存取部分被配置为使得电流通过注入带间隧穿引起的热电子而将电荷载流子注入到电浮置层中,以分别在存储单元中存储第二逻辑值。

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