A new localized ink coating methodology for preventing photoresist deformation for TEM sample preparation

摘要

In this work we reported a new methodology for ink coating for TEM sample preparation. Detailed pre-FIB and FIB processes were performed under different conditions such as method of coating used and baking temperatures. TEM profile was taken on all prepared sample to understand the critical dimensions of PR under various conditions, and a comparison was made to conclude the best coating method to minimize PR profile deformation during sample preparation. Finally, a new technique of using static glass needle to apply ink coating was introduced to enhance coating application on very localized site specific structures.