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Bumpless Ball Grid Array (BBGA) Package using a Solder Resist Cavity

机译:使用阻焊腔的浮肿球栅阵列(BBGA)包装

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In this study, the package named Bumpless Ball Grid Array (BBGA) was developed. In BBGA package, chips were buried in the cavities made with solder resist materials. For BBGA package development, epoxy based photo-patternable solder resist was used as an encapsulation material because of cost effectiveness and process simplicity. This solder resist film was laminated on the Cu plate and cavities were formed by a lithography method. After the cavity formation, chips were buried in these cavities, and then dielectric layer was applied on the solder resist and the chip surface. In this package fabrication, selecting the proper dielectric materials layer was the key issue. Therefore, proper dielectric materials and process conditions for BBGA package fabrication were investigated. Five different conventional dielectric materials were selected and processilities of these dielectric materials were tested. And for enhancing the wettability of dielectric material on a solder resist film, plasma treatment was performed. Due to the selective etching of solder resist surface, surface energy of solder resist film increased. Warpage was another issue for BBGA fabrication. Because of the warpage of Cu plate, subsequent patterning was not formed on an exact position. Therefore, by applying flattening force on BBGA, miss-alignment was reduced. And the proper dielectric material conditions for reducing warpage were investigated.
机译:在本研究中,开发了名为Bumpless Ball Grid阵列(BBGA)的包装。在BBGA包装中,芯片埋在用抗蚀剂材料制成的空腔中。对于BBGA封装开发,由于成本效益和过程简单,将环氧基的光学可图案焊料用作封装材料。将该阻焊膜层压在Cu板上,通过光刻法形成空腔。在腔体形成之后,将芯片埋在这些腔中,然后在焊料抗蚀剂和芯片表面上施加介电层。在该包装中,选择适当的介电材料层是关键问题。因此,研究了适当的介电材料和BBGA封装制造的工艺条件。选择了五种不同的传统介电材料,并测试了这些介电材料的加工。为了提高阻焊膜上的介电材料的润湿性,进行等离子体处理。由于焊料抗蚀剂表面的选择性蚀刻,焊料抗蚀剂膜的表面能增加。翘曲是BBGA制造的另一个问题。由于Cu板的翘曲,在确切位置未形成后续图案。因此,通过在BBGA上施加平坦化力,减少了错过对准。研究了用于减少翘曲的适当介电材料条件。

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