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Time-Resolved Photoluminescence Study of Carrier Recombination and Transport in Type-Ⅱ Superlattice Infrared Detector Materials

机译:Ⅱ型超晶格红外探测器材料中载流子复合和输运的时间分辨光致发光研究

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Time-resolved photoluminescence (TRPL) is used to study the minority carrier lifetime in type-Ⅱ superlattice (T2SL) infrared detector materials to investigate the recombination mechanisms, trap states and transport properties that currently limit their performance. Measurements of carrier lifetime have shown that InAs/Ga_(1-x)In_xSb T2SLs are dominated by non-radiative Shockley-Read-Hall (SRH) recombination, resulting in short minority carrier lifetimes (10's of nanoseconds at 77 K). A trap energy of ~60 meV above the valence band is identified in mid-wavelength infrared n-type InAs/Ga_(1-x)In_xSb T2SLs, where trap saturation (non-exponential decay) is observed under high injection levels due to a significantly faster hole capture rate than electron capture rate. Lifetime measurements in "Ga-free" InAs/InAs_(1-x)Sb_x T2SLs exhibit an order-of-magnitude increase in lifetime (100's of nanoseconds at 77 K) with contributions from both radiative and non-radiative recombination. This improvement is attributed to the reduction of non-radiative recombination centers from the superlattice with the elimination of Ga and suggests that the SRH trap(s) limiting the carrier lifetime of InAs/Ga_(1-x)In_xSb T2SLs is native to the Ga_(1-x)In_xSb layer. Additionally, radiative recombination is observed in an InAs/GaSb T2SL using a sub-bandgap CW laser to saturate the SRH recombination centers, yielding a radiative lifetime of ~140 ns at 77 K. Since carrier transport is a concern in Ga-free T2SLs, it is investigated by studying samples grown with and without barriers (to contain injected carriers to the absorber region). It is determined that carrier transport is poor in InAs/InGa_(1-x)In_xSb T2SLs because negligible differences are observed in the carrier lifetime.
机译:时间分辨光致发光(TRPL)用于研究Ⅱ型超晶格(T2SL)红外探测器材料中的少数载流子寿命,以研究目前限制其性能的重组机理,陷阱态和传输性质。载流子寿命的测量结果表明,InAs / Ga_(1-x)In_xSb T2SLs受非辐射肖克利-霍尔(SRH)重组的支配,导致少数载流子寿命短(77 K时为10纳秒)。在中波长红外n型InAs / Ga_(1-x)In_xSb T2SLs中发现了价带上方约60 meV的陷阱能,在高注入水平下,由于空穴捕获速率比电子捕获速率快得多。 “无镓” InAs / InAs_(1-x)Sb_x T2SL中的寿命测量结果显示,由于辐射和非辐射复合作用,寿命增加了一个数量级(在77 K时为100纳秒)。这种改善归因于超晶格减少了非辐射复合中心,并消除了Ga,这表明限制InAs / Ga_(1-x)In_xSb T2SLs载流子寿命的SRH阱是Ga_固有的(1-x)In_xSb层。此外,在InAs / GaSb T2SL中使用亚带隙CW激光器使SRH重组中心饱和,从而观察到辐射复合,在77 K时产生约140 ns的辐射寿命。由于载流子传输是无Ga T2SL中的一个问题,通过研究在有和没有障碍的情况下生长的样品(包含注入到吸收区的载流子)来进行研究。确定在InAs / InGa_(1-x)In_xSb T2SLs中载流子传输很差,因为在载流子寿命中观察到的差异可忽略不计。

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