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Field Emission Properties of Indium-Doped ZnO Nanowires Prepared on ITO Glass Substrate

机译:ITO玻璃基材上制备铟掺杂ZnO纳米线的场排放性能

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摘要

Doping is an important approach for improving the field emission properties of semiconductor nanowire field emitters. The indium-doped zinc oxide nanowires were prepared on ITO glass substrate by thermal oxidation method and field emission properties were measured. The prepared In-doped nanowire arrays shows excellent field emission performance with a turn-on field of 4.0 V/μm and current fluctuation of ~1.4%.
机译:掺杂是改善半导体纳米线场发射器的场发射特性的重要方法。通过热氧化方法在ITO玻璃基板上制备掺杂掺杂的氧化锌纳米线,并测量场发射性能。制备的掺杂纳米线阵列显示出优异的场发射性能,开启场4.0V /μm,电流波动为约1.4%。

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