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Field Electron Emission from GaAs Nanowhiskers Fabricated by MBE

机译:由MBE制造的GaAs Nanowhiskers的现场电子发射

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Semiconductor nanowhiskers (NWs) are wire-like nanocrystals with high (10-100) lendth/diameter ratio and the diameter of several tens of nanometers. Unique structural properties of NWs make them very attractive in numerous applications including optoelectronics, microelectronics, field emission devises and analytical chemistry [1]. Investigations on the electron emission properties of self-assembled GaAs NWs (Fig. 1) included measurements of the electron emission current (Ie) dependences on the potential difference (Ve) in the vacuum gap between the probe tip and GaAs NWs "surface". The electron emission properties of a selected ensemble of nanowhiskers were studied in a certain local microareas (with linear dimensions of ~10μm) which was defined prior to measurements of current-voltage characteristics (CVC) of the GaAs surface using a high-vacuum SPM mounted in the LS SPM unit ("OMICRON" Company, German). Note that the surface density of GaAs crystalline nanostructures growth on the substrate surface by MBE technique was ~10{sup}9 cm{sup}(-2). To study electron emission properties of the nanostructures, spatial scanning involved measurement of the CVCs. To this end, a saw tooth voltage was applied between the probe and the substrate during scanning, which was varied from some initial value V{sub}o to the maximum value V{sub}m. Note that the full probe displacement was carried out in a sequence of steps, with emission current I{sub}e versus voltage measurements (at fixed probe positions) at each step. The measured local CVCs (see figs. 2, 3) were stored in the RAM memory of PC and (after averaging) were displayed on the LS SPM unit monitor screen.
机译:半导体纳米须驾驶员(NWS)是具有高(10-100)型缘/直径比和数十纳米直径的线状纳米晶体。 NWS的独特结构特性使它们在许多应用中具有非常有吸引力,包括光电子,微电子,场发射和分析化学[1]。对自组装GaAs NWS(图1)的电子发射特性的研究包括在探针尖端和GaAsNWS“表面”之间的真空间隙中的电位差(Ve)的测量值。在某种局部微量野外(具有〜10μm的线性尺寸)中研究了纳瓦敏的所选集合的电子发射特性,其使用高真空SPM安装在GaAs表面的电流 - 电压特性(CVC)之前定义在LS SPM单元(“omicron”公司,德语)。注意,通过MBE技术的GaAs结晶纳米结构在基板表面上生长的表面密度为〜10 {sup} 9cm {sup}( - 2)。为了研究纳米结构的电子发射性能,空间扫描涉及CVC的测量。为此,在扫描期间在探针和基板之间施加锯齿电压,从一些初始值V {Sub} O变化到最大值V {Sub} M。注意,在每个步骤中,在一系列步骤中以一系列步骤进行完整探针位移,发射电流I {Sub} E与电压测量(在固定探针位置处)。测量的本地CVC(见图2,3)存储在PC的RAM存储器中,并且在LS SPM单元监视器屏幕上显示(平均)。

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