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Influence of the underlap length on the RF noise performance of a Schottky Barrier MOSFET

机译:下划线长度对肖特基屏障MOSFET射频噪声性能的影响

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This paper is focused on the analysis of the high-frequency dynamic and noise performance and the static characteristics of n-type Schottky barrier (SB) MOSFETs on SOI substrate. A 2D Ensemble Monte Carlo (EMC) simulator including tunnelling transport at the Schottky interfaces has been used. Quantum transmission coefficients and treatment of image charge effects on the Schottky barrier have been carefully considered. The influence of the underlap length on the main figures of merit is described, thus showing the importance of this architecture parameter for the optimization of these devices.
机译:本文专注于分析SOI衬底上的高频动力和噪声性能和N型肖特基屏障(SB)MOSFET的静态特性。已经使用了2D集合蒙特卡罗(EMC)模拟器,包括肖特基接口处的隧道传输。仔细考虑了量子透射系数和对肖特基屏障的图像电荷效应的处理。描述了下划艇长度对M优点的主要图的影响,因此显示了该架构参数的重要性来优化这些设备。

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