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Influence of the underlap length on the RF noise performance of a Schottky Barrier MOSFET

机译:重叠长度对肖特基势垒MOSFET的RF噪声性能的影响

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This paper is focused on the analysis of the high-frequency dynamic and noise performance and the static characteristics of n-type Schottky barrier (SB) MOSFETs on SOI substrate. A 2D Ensemble Monte Carlo (EMC) simulator including tunnelling transport at the Schottky interfaces has been used. Quantum transmission coefficients and treatment of image charge effects on the Schottky barrier have been carefully considered. The influence of the underlap length on the main figures of merit is described, thus showing the importance of this architecture parameter for the optimization of these devices.
机译:本文重点分析SOI衬底上n型肖特基势垒(SB)MOSFET的高频动态和噪声性能以及静态特性。已经使用了包括肖特基接口处的隧道传输在内的2D蒙特卡洛集成(EMC)仿真器。已经仔细考虑了量子透射系数和对肖特基势垒的图像电荷效应的处理。描述了下重叠长度对主要品质因数的影响,从而表明了该架构参数对于优化这些器件的重要性。

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