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An Analytical Model of Drain Induced Barrier Lowering Effect for SiC MESFETs

机译:SiC MESFET漏极诱导屏障降低效果的分析模型

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Based on an analytical solution of the two-dimensional Poisson equation in the subthreshold region, the behavior of DIBL (Drain Induced barrier lowering) effect is investigated for short channel 4H-SiC MESFETs. An analytical model of accurate threshold voltage shift model for the asymmetry short channel 4H-SiC MESFET is presented and thus verified. According to the presented model, an analysis of threshold voltage for short channel device on the L/a (channel length/channel depth) ratio, drain applied voltage V{sub}(DS) and channel doping concentration N{sub}D is made, which provides a good basis for short channel device and circuit design.
机译:基于亚阈值区域中的二维泊松方程的分析解,研究了DIBL(漏极感应屏障降低)效应的行为,用于短通道4H-SiC MESFET。提出了一种对不对称短通道4H-SiC MESFET的精确阈值电压换档模型的分析模型,从而验证。根据所提出的模型,制造了对L / A(通道长度/通道深度)比上的短沟道装置的阈值电压的分析,使施加电压V {SUB}(DS)和信道掺杂浓度n {sub} d进行了分析,为短沟道设备和电路设计提供了良好的基础。

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