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An analytical two-dimensional simulation for the GaAs MESFET drain-induced barrier lowering: a short-channel effect

机译:GaAs MESFET漏极引起的势垒降低的解析二维仿真:短沟道效应

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摘要

An analytic model for simulating the GaAs MESFET drain-induced barrier lowering and its effect on device performance are discussed. The potential barrier between the source and drain of a field-effect transistor in or near the subthreshold region is lowered by increasing the drain voltage. As the barrier is lowered to be comparable to the thermal energy, an appreciable current will flow through the channel, and the device will begin to conduct. This effect causes the threshold-voltage-control problem and degrades the device performance.
机译:讨论了用于模拟GaAs MESFET漏极引起的势垒降低及其对器件性能的影响的解析模型。通过增加漏极电压来降低亚阈值区域内或附近的场效应晶体管的源极和漏极之间的势垒。随着势垒降低到与热能相当的水平,相当大的电流将流经通道,并且设备将开始导通。这种影响会导致阈值电压控制问题,并降低器件性能。

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