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Stress and wafer warpage analysis of GaN thin film induced by transfer bonding process on 200mm Si substrate

机译:转移键合工艺在200mm Si衬底上引起的GaN薄膜的应力和晶圆翘曲分析

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In this paper we used Finite Element Modeling (FEM) to investigate the wafer bow induced during the substrate transfer process for GaN LED on 200mm silicon wafer. The substrate transfer process is to transfer the thin GaN LED device layer to a carrier wafer using a permanent bonding layer. In this work two different bonding materials were benchmarked, a metallic CuSn alloy and a Benzocyclobutene (BCB) polymer. It is important to control the wafer bow during the process because the high wafer bow value may cause problem for further process steps, besides it affects process quality such as in lithography and can be a threat to the device reliability. It was found that the wafer bow changes during substrate transfer process. Metallic bond material introduces high bow values at the end of the substrate transfer process. Different compositions of metallic bond material inlfuence the final wafer bow.
机译:在本文中,我们使用有限元建模(FEM)来研究在200mm硅晶片上的GaN LED的衬底转移过程中引起的晶片弯曲。衬底转移工艺是使用永久性粘合层将GaN LED器件薄层转移到载体晶圆上。在这项工作中,对两种不同的粘结材料进行了基准测试,一种金属CuSn合金和一种苯并环丁烯(BCB)聚合物。在工艺过程中控制晶圆弯曲度很重要,因为高晶圆弯曲度可能会影响后续工艺步骤,不仅会影响光刻工艺的质量,而且还会威胁到器件的可靠性。发现在衬底转移过程中晶片弓度发生变化。金属键合材料会在基材转移过程结束时引入较高的弯曲度。金属粘结材料的不同成分会影响最终的晶圆弯曲度。

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