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Lifetime modelling of sintered silver interconnected power devices by FEM and experiment

机译:FEM和实验终身建模烧结银相互连接功率器件

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In this paper, the research is focused on lifetime analysis and prediction of silver sintered power devices by experiment and numerical simulation. As researches are emerging on the field of lead-free interconnect technology, silver sintering become an alternative interconnect technology to standard solders. This technology differs from other interconnect technologies because of it’s improved thermal and mechanical properties. Aluminum cladded copper core (CucorAl) wires have been used to prevent early fail of top contacts. Material degradation due to thermal fatigue in the sintered silver still influences the reliability in the interconnect, in particular for high temperature swings upcoming with wide bandgap semiconductors. Plastic deformation is observed in sintered silver interconnect which depends on time and temperature. This research work presents combined experimental and finite element analysis (FEA) results for developing a lifetime model for the sintered silver power modules. Different parameters such as porosities on the sintered silver layer, substrates, plastic and creep constitutive laws, die thickness and sizes, should be considered during the development of lifetime model. In this investigation, Insulated-gate bipolar transistor (IGBT) chips are integrated on different substrates such as printed circuit board (PCB- Help H), insulated metal substrate (IMS), copper lead frame (Cu-lead frame) and direct copper bond (DCB) by silver sintered interconnect. Failure modes such as wire bond lift-off and die bond degradation are observed during this research.
机译:本文通过实验和数值模拟,研究专注于银烧蚀功率器件的寿命分析和预测。随着研究的出现在无铅互连技术领域,银烧结成为标准焊料的替代互连技术。该技术与其他互连技术不同,因为它是改善的热和机械性能。铝包覆铜芯(CUCORALAL)电线已被用于防止最早的顶部触点。由于烧结银中的热疲劳导致的材料劣化仍然影响互连的可靠性,特别是对于具有宽带隙半导体的高温摇摆。在烧结银互连中观察到塑性变形,其取决于时间和温度。该研究工作提出了组合的实验和有限元分析(FEA),以开发烧结银电源模块的寿命模型。在寿命模型的发展期间,应考虑不同参数,如烧结银层,基板,塑料和蠕变本构规则,模具厚度和尺寸的孔隙率。在该研究中,绝缘栅极双极晶体管(IGBT)芯片集成在不同的基板上,例如印刷电路板(PCB-帮助H),绝缘金属基板(IMS),铜引线框架(CU-引线框架)和直接铜键合(DCB)通过银烧结互连。在本研究期间观察到诸如引线键合和模键降解的故障模式。

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