Nanopatterning with Extreme Ultraviolet Interference Lithography for Nanoelectronics and Biotechnology

摘要

We present a platform for the controlled patterning of nano-objects such as gold colloids in the micron and nanorange. We are separating the lithography step from the subsequent functionalization. This has many advantages among them the independence of the linkage chemistry and the lithography process and the possibility to position individual nano-objects. The lithography step is Extreme UV Interference Lithography in the nanorange and standard photolithography in the micron range. As a proof of concept, micro and nanopatterns of single-stranded DNAs are created in an inert background of PLL-g-PEG. The DNA patterns are converted to arrays of DNA-tagged gold colloids by directed self-assembly using the specificity of DNA hybridization. Especially nanoline arrays of gold colloids have the potential to serve as e.g. nanowires for electrical label-free biosensing. In addition, we also present the characterization of the adsorption kinetics of 20 nm DNA-tagged gold colloids via SPR.