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Simulation of a silicon nanowire array texturing structure for photovoltaic device

机译:用于光伏器件的硅纳米线阵列纹理结构的仿真

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We have simulated a photovoltaic (PV) pn junction where a texturing structure from Silicon nanowires (NWs) is added. While the NWs diameter was kept constant at a value of 100 nm, their lengths were varied over the range from 1 μm to 100 μm. A noticeable enhancement in the device efficiency is found. This improvement is due to that the added texture has significantly decreased the optical reflectance and increased the optical absorption of the surface.
机译:我们已经模拟了光伏(PV)pn结,其中添加了来自硅纳米线(NWs)的纹理结构。虽然NW的直径保持恒定在100 nm的值,但它们的长度在1μm到100μm的范围内变化。发现设备效率显着提高。该改进是由于所添加的纹理显着降低了光反射率并增加了表面的光吸收率。

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