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Material Analysis of Lead Free Solder Deposited by Electrochemical Deposition

机译:电化学沉积沉积无铅焊料的材料分析

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Lead-free solders have essentially replaced lead-tin solders for new microelectronicapplications. At the same time, many products are continuing to go through miniaturization, sothe behavior of the solder material is changing as a function of the connection size. As lead-tinsolder has been replaced by lead-free alloys, electrodeposited SnAg has become the standardsolder alloy used on wafers. Tin-based solders exhibit a complex material structure in thedeposit, as recrystallization occurs in the deposit, and as intermetallic compounds form.Understanding the complex nature of these materials is becoming increasingly important to theperformance of our electronic products. We have characterized ECD SnAg solder alloydeposits in terms of composition, grain size, phase, microstructure, and texture using EBSDanalysis. We will discuss the effects of modifying the process parameters on the microstructurewhich could implications on the performance of the solder bump as a chip-level interconnect.We have seen that the metals deposit as β-tin with finely dispersed intermetallic grains. Wehave also seen evidence of recrystallization of the deposit subsequent to deposition, althoughthe recrystallization behaviour is significantly different than the well-characterized copperrecrystallization. Finally, the metal at the interface below the solder reacts with Sn to formintermetallic compounds, the compositions of which are dependent on the materials present.The effects of the process parameters on the deposit properties are becoming increasinglyimportant to understand in order to control the properties of the interconnection, and how itchanges over its lifetime. We have characterized the incorporation of trace organic materials inthe deposit as a function of plating parameters. The deposition of SnAg from an MSA-basedplating bath is very different from the deposition of copper from a copper sulfate plating bath.We have noticed that the incorporation of organic additive materials, as well as the grain size,increases as the deposition rate is increased in the deposition of SnAg.
机译:无铅焊料已基本上替代了用于新微电子的铅锡焊料 应用程序。同时,许多产品正在不断地进行小型化,因此 焊接材料的行为随着连接尺寸的变化而变化。作为铅锡 焊料已被无铅合金取代,电沉积SnAg已成为标准 晶圆上使用的焊料合金。锡基焊料在焊锡中表现出复杂的材料结构。 沉积物,因为在沉积物中会发生重结晶,并且会形成金属间化合物。 了解这些材料的复杂性对他们变得越来越重要。 电子产品的性能。我们已经表征了ECD SnAg焊料合金 使用EBSD在成分,晶粒尺寸,相,微结构和织构方面进行沉积 分析。我们将讨论修改工艺参数对微结构的影响 这可能会影响焊料凸点作为芯片级互连的性能。 我们已经看到,金属沉积为具有精细分散的金属间晶粒的β-锡。我们 尽管沉积后也发现了沉积物重结晶的证据,尽管 重结晶行为与特性良好的铜有显着差异 重结晶。最后,焊料下方界面处的金属与锡反应形成 金属间化合物,其组成取决于存在的材料。 工艺参数对沉积物性能的影响越来越大 重要的是要理解以控制互连的属性,以及如何进行互连 在其生命周期内发生变化。我们已经将微量有机材料的掺入特征化为 沉积物随电镀参数的变化而变化。从基于MSA的SnAg的沉积 电镀浴与从硫酸铜电镀浴中沉积铜有很大不同。 我们注意到,有机添加剂材料的加入以及晶粒尺寸, SnAg的沉积随着沉积速率的增加而增加。

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