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GHz High Frequency TSV for 2.5D IC Packaging

机译:用于2.5D IC封装的GHz高频TSV

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TSV (Through Silicon Via) is the key enabling technology for 2.5D & 3D IC stacking solution in FCBGA(Flip Chip Ball Grid Array). As the 2.5D interposer design pushing toward smaller & shorter via due to high I/Odensity and high frequency requirement, the electrical performance of thinner interposer is therefore much morechallenging in low signal loss performance for high frequency application and process.From the structure point of view, the silicon interposer is an additive layer between top side chip(s) andbottom side substrate, it is therefore an additional electrical interconnection which affects the signalpropagation between chip(s) and substrate. Therefore, the performance of the TSV insertion loss in siliconinterposer becomes critical, especially for above GHz application.Real measurement is conducted to validate the electrical performance of TSV interconnection up to 67GHz,and the wideband scalable model of TSV is also proposed and compared with the measured data. Themeasurement of this TSV structure has demonstrated the advantages with low parasitic capacitance and lowinsertion loss at high frequency. Full validated reliability test is also presented to verify interposer fabrication,assembly process optimization, and interconnection stability of the 2.5D IC package.
机译:TSV(Through Silicon Via)是FCBGA中2.5D和3D IC堆叠解决方案的关键启用技术 (倒装芯片球栅阵列)。由于高I / O,2.5D插入器设计朝着更短和更短的通孔方向发展 密度和高频要求,因此更薄的中介层的电气性能要好得多 在高频应用和过程中低信号丢失性能方面具有挑战性。 从结构的角度来看,硅中介层是顶部芯片与硅片之间的附加层。 底面基板,因此是影响信号的附加电互连 芯片和基板之间的传播。因此,硅中TSV插入损耗的性能 插入器变得至关重要,尤其是对于GHz以上的应用。 进行了实际测量,以验证高达67GHz的TSV互连的电气性能, 并提出了TSV的宽带可扩展模型,并与实测数据进行了比较。这 对这种TSV结构的测量已证明具有低寄生电容和低寄生电容的优点 高频插入损耗。还提出了经过充分验证的可靠性测试,以验证中介层的制造, 装配工艺的优化,以及2.5D IC封装的互连稳定性。

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