NANO-IMPRINTING FOR POLYCRYSTALLINE SILICON THIN-FILM SOLAR CELLS ON GLASS SUPERSTRATE APPLICATION

摘要

Light trapping is essential for ～2μm poly-Si thin-film solar cells due to weak absorption of the nearinfrared light and is generally realized by texturing glass. Nano-imprinting is one such method texturing glass. It capableof producing textures in a well controlled way and is a cheap and fast way of transferring micro/ nanometer patterns,which potentially can be implemented in a roll-to-roll approach. It is developed in this work to transfer patterns fromtextured glass to sol-gel coated planar glass. A baseline nano-imprinting process is setup and the compatibility of theresulting patterns with the poly-Si thin-film solar cell processing is also investigated.