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SOI based double source tunnel FET (DS-TFET) with high on-current and reduced turn-on voltage

机译:基于SOI的双源隧道FET(DS-TFET),具有高电流和降低的开启电压

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A novel TFET known as Double Source Tunnel FET (DS-TFET) is proposed in this paper, which provides higher ON current (ID-ON) with smaller turn-on voltage as compared to present Si based Tunnel FETs. The tunneling area is considerably enhanced which in turn increased the on-current ID-ON (~29.2 μA/μm) for a smaller turn-on voltage (Vtu = 0.15 volt). The results of rigorous 2D simulation are presented in this paper for various performance parameters which have shown noticeable improvement viz sub-threshold slope (MinSS~30.92 mV/decade) and ID-ON/ID-OFF (~1010). The impact of varying gate dielectric constant and the tunnel gap (LTS) is also studied and optimized for the better performance. The obtained results of the proposed work are compared with L-shaped Tunnel FET and we have procured that the proposed structure is better than the earlier reported L-shaped TFET.
机译:本文提出了一种称为双源隧道FET(DS-TFET)的新型TFET,其在基于SI的情况下,具有更小的开启电压的电流(I D-on )提供更高的电流(I d-on )隧道FET。隧道区域显着增强,其又增加了电流I D-ON (〜29.2μA/μm),以进行较小的开启电压(V tu = 0.15伏)。本文提出了严格的2D仿真结果,用于各种性能参数,其显示出明显的改善副阈值斜率(min ss 〜30.92 mv / deadade)和i d-on < / sub> / i d-off (〜10 10 )。还研究了不同栅极介电常数和隧道间隙(L TS )的影响,并优化了更好的性能。所获得的工作的结果与L形隧道FET进行比较,我们采购了所提出的结构优于先前报告的L形TFET。

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