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Preparation of Amorphous p-type InGaZnO_4 Films by Codoping of Al and N Atoms

机译:Al和N原子共掺杂制备非晶p型InGaZnO_4薄膜

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Codoped InGaZnO_4 films were prepared by sputtering of targets consisting of InGaZnO_4 and AIN in an Ar atmosphere. The hole-conductivity is confirmed in films prepared from the target(7% AIN) at 2×10~(-2) Torr in 0.3-0.6% O_2 atmosphere. The rectification characteristic is obtained for a PN junction of InGaZnO_4 films.
机译:通过在Ar气氛中溅射由InGaZnO_4和AIN组成的靶材来制备共掺杂InGaZnO_4膜。在0.3-0.6%O_2气氛中,在2×10〜(-2)Torr下,由目标(7%AIN)制备的薄膜中确认了空穴导电性。获得了InGaZnO_4薄膜的PN结的整流特性。

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