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Preparation and characteristic of p-type ZnO films by Al-N codoping technique

机译:Al-N共掺杂技术制备p型ZnO薄膜及其特性

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摘要

p-Type conduction in ZnO thin films have been realized by the Al-N codoping method. The codoped films with c-axis orientations were prepared at various substrate temperatures in the range of 300-600 deg C in pure N_2O ambient .The codoped film prepared at 500 deg C shows the lowest resistivity of 54.8 OMEGA cm and highest carrier concentration of 1.32 X 0~(18) cm~(-3), which is about 10~4 times higher than that of N doped ZnO, and the film shows the best crystal quality.
机译:ZnO薄膜中的p型导电已通过Al-N共掺杂方法实现。在纯N_2O环境中于300-600摄氏度范围内的各种衬底温度下制备c轴共掺杂膜.500摄氏度下制备的共掺杂膜的最低电阻率是54.8Ω·cm,最高载流子浓度是1.32 X 0〜(18)cm〜(-3),约为氮掺杂ZnO的10〜4倍,薄膜的晶体质量最好。

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