The Study of Al-N Codoped ZnO Thin Films Prepared by DC Magnetron Sputtering

摘要

The codoped ZnO thin film were deposited by DC magnetron sputtering on silicon (111) followed by annealing treatment at 200°C and 600°C for 1 hour in nitrogen and oxygen gas mixture. Structural investigation was carried out by scanning electron microscopy (SEM), atomic force microscopy and X-ray diffraction (XRD). Film roughness and grain shape were found to be correlated with the annealing temperatures.