Super Low-Temperature Formation of Polycrystalline Silicon Films on Plastic Substrates by Underwater Laser Annealing

摘要

We succeeded in the super low-temperature crystallization to high-quality poly-Si films on plastic substrates by underwater laser annealing (WLA). WLA enhances the energy margin twice as high as that in laser annealing in air (LA). Moreover, the crystallinity of WLA poly-Si was much better than that of LA poly-Si.