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Effect of palladium on copper aluminide intermetallic growth in palladium copper bonding wire

机译:钯对钯铜粘接线铜铝化物质生长的影响

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The reliability of copper bonding wire in plastic mold package has been associated with the intermetallic compound formation and growth in the presence of halogen element such as chloride in epoxy molding compound. Much have been studied on copper aluminide intermetallic compounds at the copper/aluminium interface such as CuAl, CuAl2 and particularly Cu9Al4 which is known to link with failure in copper wire bonding. Riding on the success of incorporating palladium in gold bonding wire to improve Au/Al interface reliability, same approach has been applied to add this noble metal to copper bonding wire via plating to form Pd coated copper wire and allows the Pd to dissolve into copper matrix and prevent or delay copper rich IMC formation that leads to failure. It has been observed in industry that Pd rich phase formed when Pd coated copper wire forms a free air ball but whether the Pd can completely cover the entire ball before bonding is still of question. Moreover, whether there is a consistent layer of Pd or Pd rich phase formed to separate or prevent transformation of aluminium rich IMC to copper rich IMC has yet to be seen as only partial areas in the Pd coated copper bonded ball has seen the evident. The fact that the Pd coating can be of various thickness when plated on the copper wire surface, whether the thickness will change the characteristics of Pd rich phase or provide more uniformity has yet to be seen. It was known that EFO process to form FAB has great influence in the Pd distribution and hence in the bonded ball. How the Pd thickness affects the distribution has yet to be understood. This paper examines Pd distribution in the Cu-Al intermetallic phase bonded with Pd coated wires of different Pd thickness in as bonded condition and high temperature thermal aging of 250°C. Microstructural analysis via TEM and EDS revealed presence of voids which is related to presence of Pd. Pd distribution is affected by the EF- current used to form FAB and also Pd thickness has also influence in presence of Pd across the bond interface. Apart for the known copper rich Cu9Al4 phase, Pd is also found in the Cu rich IMC which needs more detail investigation on whether a new compound is formed.
机译:塑料模具包装中的铜粘合线的可靠性与金属间化合物形成和生长有关,在环氧模塑化合物中的氯化物如卤素质中存在。铜/铝界面上的铜铝化合物化合物如Cual,Cual 2 ,特别是Cu 9 Al 4 已知与铜线键合的故障联系起来。乘坐成功掺入金键合线以改善Au / Al界面可靠性,已经应用了相同的方法,以通过电镀将该贵金属添加到铜粘合线上以形成Pd涂覆的铜线并允许PD溶解成铜基质并防止或延迟铜丰富的IMC形成导致失败。它在工业中观察到PD富相位在PD涂覆的铜线形成自由空气球时形成,但在粘接之前Pd是否可以完全覆盖整个球。另外,是否存在形成的Pd或Pd富相的一致层,以分离或防止富含铝的富含铜的IMC转化为富含铜的IMC尚未被视为仅在PD涂覆的铜粘结球中看到的偏见。当Pd涂层在铜线表面上电镀时,Pd涂层可以具有各种厚度的事实,厚度是否会改变Pd富相位的特性,或者尚未看到更均匀性。已知形成Fab的EFO方法对PD分布产生很大影响,因此在粘合的球中。 PD厚度如何影响分布尚未理解。本文将Cu-Al金属间相位的PD分布与不同PD厚度的PD涂覆的电线粘合,以键合条件和高温热老化为250° c。通过TEM和EDS的微观结构分析显示出与PD的存在有关的空隙。 PD分布受用于形成Fab的EF电流的影响,并且PD厚度也在粘合界面上在PD存在下影响。除了已知的铜富铜Cu 9 Al 4 阶段,PD也在CU丰富的IMC中发现,需要更详细地研究是否形成了新化合物。

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