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Technology optimization for high bandwidth density applications on 3D interposer

机译:3D插入器高带宽密度应用的技术优化

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3D interposers are one of just a few ways of making electronic systems faster and more powerful, but their design can be complex. This paper presents a optimization flow to assist the design of silicon interposers with the highest bandwidth density possible. Using the methodology described in this paper, simulations have shown that chip-to-chip links on a silicon interposer can achieve bandwidth densities between 250Gbps/mm and 4.5Tbps/mm depending on a wide range of parameters such as interconnect length, interlayer dielectric (ILD) material and micro-bump pitch.
机译:3D插入器是使电子系统更快,更强大的几种方式之一,但它们的设计可以复杂。本文呈现了优化流动,以帮助设计具有最高带宽密度的硅中介体。使用本文中描述的方法,已经显示硅插入器上的芯片芯片链路可以根据诸如互连长度,中间层电介质的宽范围的参数来实现250gbps / mm和4.5tbps / mm之间的带宽密度。 ILD)材料和微凸块间距。

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