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Lithography cost savings through resist reduction and monitoring program

机译:通过减少抗蚀剂和监控程序来节省光刻成本

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Photolithography has been one of the primary processes driving semiconductor advances for the past few decades. In order to make faster, more reliable devices, designers drive circuit scaling to its limits. Equipment and material suppliers must create products to meet the throughput and lithographic performance standards required of advanced devices. Track equipment performance and process architecture have improved to meet throughput considerations, and therefore the cost of lithography tracks has remained relatively constant and few equipment changes are remaining which will drastically reduce the cost of lithography. On the other hand, the cost of photolithography materials has drastically increased due to the complexity of the chemistries required to resolve shrinking critical dimensions. In addition, new technology nodes have often required additional processing layers, adding to the high cost of materials in the lithography process. These increased costs are directly delivered to the wafer for processes where high volumes of chemical or multiple layers are needed to properly coat a wafer for further processing. By fine tuning the coating process, a track equipment engineer can reduce resist cost per wafer by reducing the volume dispensed on the wafer. While reducing the resist volume to extremely low levels is attractive, it can also introduce risks into the coating process. Any interruption in the low volume dispense can cause a poor coating or no-coat situation, thus creating a wafer that requires rework or scrap. If the event is detected at the point of dispense, the wafer can be reworked. If the wafer escapes undetected until a post-lithography metrology step, it must be scrapped. This paper evaluates the cost benefits of utilizing an advanced dispense system, such as the IntelliGen® Mini, made by Entegris, Inc., combined with an every-wafer point-of-dispense monitoring strategy. This paper will discuss the means to reduce resist dispense volumes b--y up to 60% and the ability to track every dispense, decreasing overall scrap and the need for some routine metrology. In addition, the authors will show a return-on-investment summary for undertaking such a project.
机译:在过去的几十年中,光刻一直是推动半导体发展的主要过程之一。为了制造更快,更可靠的设备,设计人员将电路规模推向了极限。设备和材料供应商必须制造满足高级设备要求的产量和光刻性能标准的产品。轨道设备的性能和过程架构已得到改进,以满足吞吐量方面的考虑,因此,光刻轨道的成本保持相对恒定,并且几乎没有设备更改,这将大大降低光刻成本。另一方面,由于解决缩小的临界尺寸所需的化学工艺的复杂性,光刻材料的成本已急剧增加。另外,新技术节点通常需要附加的处理层,从而增加了光刻工艺中材料的高成本。这些增加的成本直接传递给晶圆,用于需要大量化学物质或多层涂层才能正确覆盖晶圆以进行进一步处理的过程。通过微调涂层工艺,轨道设备工程师可以通过减少分配在晶圆上的体积来降低每个晶圆的抗蚀剂成本。将抗蚀剂的体积减小到极低的水平虽然很吸引人,但它也会给涂覆过程带来风险。小体积分配的任何中断都可能导致不良的涂层或无涂层情况,从而产生需要返工或报废的晶圆。如果在分配点检测到事件,则可以对晶片进行重新加工。如果在光刻后的计量步骤之前未检测到晶圆逸出,则必须将其报废。本文评估了使用先进的分配系统(如Entegris,Inc.制造的IntelliGen®Mini)与每个晶片的分配点监控策略相结合的成本效益。本文将讨论减少抗蚀剂分配量的方法。 -- 高达60%的性能,并且能够跟踪每次分配,从而减少了整体报废,并减少了一些常规计量的需求。此外,作者还将显示进行该项目的投资回报摘要。

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