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Reducing environmentally induced defects while maintaining productivity

机译:减少环境导致的缺陷,同时保持生产率

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In Semiconductor manufacturing we expect the cause of defects to be process or tool related. However, at recent technology nodes we find that defects can be caused by issues related to the wafers environment, such as processing of other wafers in the same tool or in the same carrier, or by seemingly innocuous actions. One result is the rapid proliferation of queue time restrictions and batching rules. In this work we show defects which are caused by the environment and several ways to reduce the sensitivity to environmental factors. Process and tool changes are found to eliminate yield detractors. We also present a workaround that has helped to reduce the impact of queue time restrictions on cycle time.
机译:在半导体制造中,我们希望缺陷的原因与工艺或工具有关。但是,在最近的技术节点上,我们发现缺陷可能是由与晶片环境有关的问题引起的,例如在同一工具或同一载体中处理其他晶片,或看似无害的动作。结果之一是队列时间限制和批处理规则的迅速扩散。在这项工作中,我们展示了由环境引起的缺陷以及降低对环境因素的敏感性的几种方法。发现工艺和工具的改变消除了产量下降的因素。我们还提出了一种变通办法,它有助于减少队列时间限制对周期时间的影响。

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