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Superhydrophobic nickel films fabricated by electro/electroless deposition

机译:通过化学沉积/化学沉积制备的超疏水镍膜

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Superhydrophobic nickel films were prepared by electrodeposition and electroless deposition without chemical modification. Experimental results reveal that the nickel film fabricated by electrodeposition is characterized with nanocone arrays and only has a contact angle of about 112°. By coupling electroless deposition, as the second step, hemispherically topped nanocones are generated and a high contact angle as much as 152.3° is obtained; that is, nickel surface has successfully transformed from hydrophobic to superhydrophobic.
机译:通过电沉积和化学沉积无需化学修饰即可制备超疏水镍膜。实验结果表明,通过电沉积制备的镍膜具有纳米锥阵列的特征,并且仅具有约112°的接触角。通过耦合化学沉积,作为第二步,生成了半球形顶部的纳米锥,并获得了高达152.3°的高接触角。也就是说,镍表面已成功地从疏水性转变为超疏水性。

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