A METHOD FOR THE FORMATION OF AN INDIUM OXIDE FILM BY ELECTRO DEPOSITION PROCESS OR ELECTROLESS DEPOSITION PROCESS, A SUBSTRATE PROVIDED WITH SAID INDIUM OXIDE FILM FOR A SEMICONDUCTOR ELEMENT, AND A SEMICONDUCTOR ELEMENT PROVIDED WITH SAID SUBSTRATE

摘要

The invention relates to a film-forming method for forming an indium oxide film on an electrically conductive substrate by immersing said substrate and a counter electrode in an aqueous solution containing at least nitrate ion and indium ion and flowing an electric current between said substrate and said counter electrode whereby causing the formation of said indium oxide film on said substrate and to a substrate for a semiconductor element and a photovoltaic element produced by using said film forming method. Moreover the invention relates to an aqueous solution for the formation of an indium oxide film by electroless deposition process, containing at least nitrate ion, indium ion and tartrate, to a film-forming method for the formation of an indium oxide film on a substrate by electroless deposition process, using said aqueous solution and to a substrate for a semiconductor element and a photovoltaic element produced by using said film forming method.