Cluster carbon implants — Cluster size and implant temperature effect

摘要

In this paper we present results for amorphous layer thickness and interface roughness for various cluster carbon ions as well as monomer carbon implants for various doses implanted at different implant temperatures. The effect of cluster size, implant dose, implant dose rate and wafer implant temperatures are discussed based on Spectroscopic Ellipsometry, TEM and RBS/channeling techniques.