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Structural Characterization of Electrodeposited Nickel-iron Alloy Films

机译:电沉积镍铁合金薄膜的结构表征

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Nickel-iron nanocrystalline alloy films were prepared on copper substrates by electrochemical deposition at various current densities of 6, 9.7, 11.5 and 15.2 A dm~(-2). X-ray diffraction measurements confirmed that all nickel-iron alloy films formed have face-centered cubic structure. The structural parameters such as the lattice constant, crystallite size, microstrain and dislocation density were determined for the nickel-iron alloy films. The crystallite size of the films reduced from 17 to 12.9 nm when the current densities were decreased. The reduction in crystallite size increased the dislocation density. Magnetic property measurements using alternating gradient magnetometer indicated that these alloys were ferromagnetic. The saturation magnetization Ms of nickel-iron alloy films increased with decreasing deposition current density, which was attributed to the increase of iron content. Nickel-iron alloy film prepared at deposition current density of 6 A dm"2 showed the maximum value of Ms. The coercivity of nickel-iron alloy films increased with decreasing current density, which was likely caused by reduction in crystallite size.
机译:通过在6、9.7、11.5和15.2 A dm〜(-2)的不同电流密度下进行电化学沉积,在铜基板上制备了镍-铁纳米晶合金膜。 X射线衍射测量证实,所形成的所有镍-铁合金膜均具有面心立方结构。确定了镍铁合金薄膜的晶格常数,微晶尺寸,微应变和位错密度等结构参数。当电流密度减小时,膜的微晶尺寸从17nm减小到12.9nm。晶粒尺寸的减小增加了位错密度。使用交变梯度磁力计的磁性能测量表明这些合金是铁磁性的。镍铁合金薄膜的饱和磁化强度Ms随着沉积电流密度的降低而增加,这归因于铁含量的增加。以6 A dm·2的沉积电流密度制备的镍铁合金膜显示出Ms的最大值。镍铁合金膜的矫顽力随电流密度的降低而增加,这很可能是由于晶粒尺寸减小所致。

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