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首页> 外文期刊>International Journal of Electrochemistry >Analysis of Electrodeposited Nickel-Iron Alloy Film Composition Using Particle-Induced X-Ray Emission
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Analysis of Electrodeposited Nickel-Iron Alloy Film Composition Using Particle-Induced X-Ray Emission

机译:粒子诱导的X射线发射分析电沉积镍铁合金薄膜成分

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摘要

The elemental composition of electrodeposited NiFe thin films was analyzed with particle-induced X-ray emission (PIXE). The thin films were electrodeposited on polycrystalline Au substrates from a 100 mM NiSO4, 10 mM FeSO4, 0.5 M H3BO3, and 1 M Na2SO4solution. PIXE spectra of these films were analyzed to obtain relative amounts of Ni and Fe as a function of deposition potential and deposition time. The results show that PIXE can measure the total deposited metal in a sample over at least four orders of magnitude with similar fractional uncertainties. The technique is also sensitive enough to observe the variations in alloy composition due to sample nonuniformity or variations in deposition parameters.
机译:用粒子诱导的X射线发射(PIXE)分析了电沉积NiFe薄膜的元素组成。在100 weremM的NiSO4、10mM的FeSO4、0.5 M的H3BO3和1 M的Na2SO4溶液中,将薄膜电沉积在多晶Au基板上。分析了这些膜的PIXE光谱,以获得Ni和Fe的相对含量,这些相对含量是沉积电位和沉积时间的函数。结果表明,PIXE可以测量样品中至少4个数量级的总沉积金属,且具有相似的不确定度。该技术还足够敏感,可以观察到由于样品不均匀或沉积参数变化而引起的合金成分变化。

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